Oxazine compound, composition and cured product

ABSTRACT

The present invention provides an oxazine compound having a specific structure, which contains a group having an aromatic ring structure and a plurality of specified carbon-carbon triple bond structure. The present invention further provides a composition containing the oxazine compound having a specific structure of the present invention, a cured product containing the composition, and a laminate having a layer of the cured product. The present invention further still provides a composition for a heat-resistant material and a composition for an electronic material, which contain the composition containing the oxazine compound of the present invention.

TECHNICAL FIELD

The present invention relates to an oxazine compound excellent in heatresistance, dielectric properties, and low hygroscopicity, acomposition, a cured product, and a laminate each containing the oxazinecompound. The present invention further relates to a heat-resistantmaterial and a heat-resistant member, and an electronic material and anelectronic member each containing the oxazine compound.

BACKGROUND ART

Various resins such as an epoxy resin, a cyanate ester resin, abismaleimide-triazine resin, and a benzoxazine resin have been used as aresin material for an electronic component used for a semiconductorsealing material and an insulating layer for a multilayer printed board,and in recent years, in various applications, particularly inmost-advanced electronic materials applications, materials andcompositions which realize further improvement in performance such asheat resistance and dielectric properties and exhibit low moistureabsorptivity have been required.

Among them, benzoxazine, which can be easily prepared by combining aphenol compound, an amine compound, and formaldehyde, undergoesring-opening polymerization by heating by itself, and exhibits high heatresistance and low linear expansion due to a strong hydrogen bondingstructure formed in a crosslinked structure. From this reason, nowadays,the benzoxazine is not only examined for the above-mentioned applicationof electric materials, but also attracts attention as a resin materialfor next generation devices typified by SiC power semiconductors.

As benzoxazine in the related art, benzoxazines prepared from abifunctional phenol such as bisphenol F and bisphenol A and aniline aredisclosed in PTL 1 and PTL 2. However, since an aniline-derivedcomponent is generated as a decomposed gas at the time of ring-openingof oxazine, the thermal decomposition resistance which is an index oflong-term thermal durability has not reached a level required in recentyears, and thus further improvement and performance improvement arestrongly desired.

CITATION LIST Patent Literature

[PTL 1] JP-A-11-12258

[PTL 2] JP-A-2000-169456

SUMMARY OF INVENTION Technical Problem

An object of the present invention is to provide a novel oxazinecompound which is excellent in thermal decomposition resistance andexcellent in dielectric properties and low hygroscopicity. Anotherobject of the present invention is to provide a composition containingthe novel oxazine compound, a cured product, and a laminate containingthe cured product. Still another object of the present invention is toprovide a heat-resistant material and an electronic material whichcontain the novel oxazine compound.

Solution to Problem

As a result of intensive studies, the inventors of the present inventionhave found that an oxazine compound containing a group having anaromatic ring structure and a plurality of specified carbon-carbontriple bond structures achieves the above objects.

That is, the present invention provides an oxazine compound which has astructure of General Formula (1) and further has at least two or morefunctional groups R¹ each independently represented by General Formula(2) so as to achieve the above objects.

(In Formula (1), Ar¹ represents a substituted or unsubstituted aromaticgroup, a ring A represents a substituted or unsubstituted aromatic ring,and the compound of Formula (1) may have an alkyl group having 1 to 3carbon atoms or a substituted or unsubstituted aromatic group.)

[Chem. 2]

a ¹-X¹—Y¹—X²—≡—R²  (2)

(In Formula (2), X¹, X², and Y¹ each independently represent a singlebond or a divalent linking group, R² represents a hydrogen atom, ahydrocarbon group, or a hydrocarbon group in which one or more hydrogenatoms contained in the hydrocarbon group are substituted with any one ofa hydroxyl group, an alkoxy group, and a halogen atom, and a¹ representsa bonding point to the oxazine compound (1).)

The present invention further provides a composition containing theoxazine compound of the present invention, a cured product containingthe composition, and a laminate having a layer of the cured product. Thepresent invention further still provides a composition for aheat-resistant material and a composition for an electronic material,which contain a composition containing the oxazine compound of thepresent invention.

Advantageous Effects of Invention

The cured product of the oxazine compound of the present invention isexcellent in the thermal decomposition resistance, the dielectricproperties, and the low hygroscopicity, and thus it can be suitably usedfor a heat-resistant member and an electronic member. In particular, itcan be suitably used for a semiconductor sealing material, a circuitboard, a build-up film, a build-up substrate, and the like. It can alsobe suitably used for a matrix resin of a fiber-reinforced resin, and isparticularly suitable as a prepreg with high heat resistance.

DESCRIPTION OF EMBODIMENTS

<Oxazine Compound>

The oxazine compound of the present invention has the structure ofGeneral Formula (1) and further has at least two or more functionalgroups R¹ each independently represented by General Formula (2).

(In Formula (1), Ar¹ represents a substituted or unsubstituted aromaticgroup, and a ring A represents a substituted or unsubstituted aromaticring, and the compound of Formula (1) may have an alkyl group having 1to 3 carbon atoms or a substituted or unsubstituted aromatic group.)

[Chem. 4]

a ¹-X¹—Y¹—X²—≡—R²  (2)

(In Formula (2), X¹, X², and Y¹ each independently represent a singlebond or a divalent linking group, R² represents a hydrogen atom, ahydrocarbon group, or a hydrocarbon group in which one or more hydrogenatoms contained in the hydrocarbon group are substituted with any one ofa hydroxyl group, an alkoxy group, and a halogen atom, and a¹ representsa bonding point to the oxazine compound (1).)

In Formula (1), a bonding moiety of the functional group R¹ is notparticularly limited, and for example, two or more of them may be bondedto the oxazine ring moiety, two or more of them may be bonded to thering A, or may be bonded to each of the oxazine ring and the ring A. Inaddition, it may be bonded to the aromatic group Ar¹ in Formula (1).

As a preferable structure, a structure in which the functional group R¹is bonded to each of the aromatic group Ar¹ and the ring A in Formula(1) is preferable from the aspect of improving the heat resistance.Specifically, a structure represented by Formula (1-1) is exemplified.

(In Formula (1-1), R¹'s are each independently a functional grouprepresented by General Formula (2) or (3), and R³ and R⁴ eachindependently represent a hydrogen atom, an alkyl group having 1 to 3carbon atoms, or a substituted or unsubstituted aromatic group.)

In the oxazine compound represented by Formula (1), any arbitraryhydrogen atom present on any arbitrary carbon atom may be substituted.In the case of the hydrogen atom being substituted, an alkyl grouphaving 1 to 3 carbon atoms and a substituted or unsubstituted aromaticgroup are preferable. The moiety where the hydrogen atom may besubstituted is not particularly limited.

<Functional Group R¹>

In the present invention, the functional group R¹ is a group having acarbon-carbon triple bond structure, and is, specifically, a grouprepresented by Formula (2). In the oxazine compound of the presentinvention, two curing reactions, a curing reaction derived from the ringopening polymerization of the oxazine ring and a curing reaction derivedfrom the polymerization reaction of the carbon-carbon triple bond,proceed, and thus a dense crosslinked structure is formed when cured,thereby improving the heat resistance, particularly the thermaldecomposition temperature. In particular, the oxazine compound of thepresent invention has two or more functional groups R¹, and this isbecause the cured product forms a more dense three-dimensionalcrosslinking by multifunctionalization, and the heat resistance isfurther improved.

The functional group R¹ is a group represented by Formula (2), and twoor more thereof are present in Formula (1); however, the structure ofthe functional group may be different from or the same as each other.

[Chem. 6]

a ¹-X¹—Y¹—X²—≡—R²  (2)

(In Formula (2), X¹, X², and Y¹ each independently represent a singlebond or a divalent linking group, R² represents a hydrogen atom, ahydrocarbon group, or a hydrocarbon group in which one or more hydrogenatoms contained in the hydrocarbon group are substituted with any one ofa hydroxyl group, an alkoxy group, and a halogen atom, and a¹ representsa bonding point to the oxazine compound (1).)

As the divalent linking group in each of X¹, X², and Y¹ in Formula (2),an oxygen atom; a divalent hydrocarbon group; a divalent group in whichone or more hydrogen atoms contained in a divalent hydrocarbon group aresubstituted with a hydroxyl group, an alkoxy group, or a halogen atom; acarbonyl group (—CO— group); an ester group (—COO— group); an amidegroup (—CONH— group); an imino group (—C═N— group); an azo group (—N═N—group); a sulfide group (—S— group); a sulfone group (—SO₃— group); anda divalent linking group formed by combining two or more these groups.

Examples of the divalent hydrocarbon group include an alkylene group, analkenylene group, an alkynylene group, a cycloalkylene group, an arylenegroup, an aralkylene group (a divalent group having an alkylene groupand an arylene group).

Examples of the alkylene group include a methylene group, an ethylenegroup, a propylene group, a butylene group, a pentylene group, and ahexylene group.

Examples of the alkenylene group include a vinylene group, a 1-methylvinylene group, a propenylene group, a butenylene group, and apentenylene group.

Examples of the alkynylene group include an ethynylene group, apropynylene group, a butynylene group, a pentynylene group, and ahexynylene group.

Examples of the cycloalkylene group include a cyclopropylene group, acyclobutylene group, a cyclopentylene group, and a cyclohexylene group.

Examples of the arylene group include a phenylene group, a tolylenegroup, a xylylene group, and a naphthylene group.

Examples of the aralkylene group include an aralkylene group having 7 to20 carbon atoms and having an alkylene group and an arylene group.

In the case of being a divalent group where at least one hydrogen atomcontained in the hydrocarbon group is substituted with a hydroxyl group,an alkoxy group, or a halogen atom, examples thereof include a hydroxylgroup-containing alkylene group, an alkoxy group-containing alkenylenegroup, a halogenated alkylene group, a hydroxyl group-containingalkenylene group, an alkoxy group-containing alkenylene group, ahalogenated alkenylene group, a hydroxyl group-containing alkynylenegroup, an alkoxy group-containing alkynylene group, a halogenatedalkynylene group, a hydroxyl group-containing cycloalkylene group, analkoxy group-containing cycloalkylene group, a halogenated cycloalkylenegroup, a hydroxyl group-containing arylene group, an alkoxygroup-containing arylene group, a halogenated arylene group, a hydroxylgroup-containing aralkylene group, an alkoxy group-containing aralkylenegroup, and a halogenated aralkylene group.

Examples of the hydroxyl group-containing alkylene group include ahydroxyethylene group and a hydroxypropylene group. Examples of thealkoxy group-containing alkylene group include a methoxyethylene group,a methoxypropylene group, an allyloxymethylene group, anallyloxypropylene group, a propargyloxymethylene group, and apropargyloxypropylene group. Examples of the halogenated alkylene groupinclude a chloromethylene group, a chloroethylene group, achloropropylene group, a bromomethylene group, a bromoethylene group, abromopropylene group, a fluoromethylene group, a fluoroethylene group,and a fluoropropylene group.

Examples of the hydroxyl group-containing alkenylene group include ahydroxybutenylene group and a hydroxypentenylene group. Examples of thealkoxy group-containing alkenylene group include a methoxybutenylenegroup and an ethoxyhexenylene group. Examples of the halogenatedalkenylene group include a chloropropenylene group and abromopentenylene group.

Examples of the hydroxyl group-containing alkynylene group include ahydroxypentynylene group and a hydroxyhexynylene group. Examples of thealkoxy group-containing alkynylene group include an ethoxyhexynylenegroup and a methoxyheptynylene group. Examples of the halogenatedalkynylene group include a chlorhexynylene group and a fluorooctynylenegroup.

Examples of the hydroxyl group-containing cycloalkylene group include ahydroxycyclohexanylene group. Examples of the alkoxy group-containingcycloalkylene group include a methoxycyclopentanylene group. Examples ofthe halogenated cycloalkylene group include a dichlorocyclopentanylenegroup.

Examples of the hydroxyl group-containing arylene group include ahydroxyphenylene group. Examples of the alkoxy group-containing arylenegroup include a methoxyphenylene group, an ethoxyphenylene group, anallyloxyphenylene group, and a propargyloxyphenylene group. Examples ofthe halogenated arylene group include a chlorophenyl group, abromophenyl group, a fluorophenyl group, a chloronaphthyl group, abromonaphthyl group, and a fluoronaphthyl group.

Besides the above, the divalent linking group in each of X¹, X², and Y¹may be an unsaturated hydrocarbon group-containing arylene group.Examples of the unsaturated hydrocarbon group-containing arylene groupinclude vinylphenylene, allylphenylene, ethynylphenylene, andpropargylphenylene.

In Formula (2), as to Y¹, it is preferably any one of linking groupsselected from the group consisting of a single bond, an oxygen atom, analkylene group, and an aralkylene group.

The divalent linking group in each of X¹, X², and Y¹ is preferably asingle bond, a divalent hydrocarbon group, or an oxygen atom, and thedivalent hydrocarbon group is preferably an alkylene group or an arylenegroup. As a particularly preferably combination, X¹ is a single bond ora phenylene group, X² is a methylene group (—CH₂—), and Y¹ is an oxygenatom.

As to Formula (2), the following structures are preferably exemplified.

(In Formula (2-3), R⁵ represents a hydrogen atom, a hydrocarbon group,or a hydrocarbon group in which one or more hydrogen atoms contained inthe hydrocarbon group are substituted with any one of a hydroxyl group,an alkoxy group, and a halogen atom.)

The case where Formula (2) is (2-2) and (2-3) having a propargyl ethergroup and the case where R⁴ is a hydrogen atom are particularlypreferable. In Particular, in the case where the propargyl ether groupis bonded to the aromatic ring, the propargyl ether group is expected toreact to form a double bond-containing cyclic structure. When the doublebond-containing cyclic structures further react with each other, a densecrosslinked structure is formed, so that the heat resistance is expectedto be improved.

<Ar¹ and Ring A>

In the compound of Formula (1), Ar¹ represents a substituted orunsubstituted aromatic group, and specific examples thereof include aphenylene group, a naphthylene group, and an arylene group containinganthracene skeleton or a phenanthrene skeleton.

The ring A represents a substituted or unsubstituted aromatic ring.Specific examples of the aromatic ring include a benzene ring, anaphthalene ring, an anthracene ring, and a phenanthrene ring.

As the oxazine compound of the present invention, preferable structuresare compounds represented by Formulae (1-a) to (1-c).

More specifically, compounds represented by the Formulae (1-d) to (1-g)are preferable.

Among them, compounds represented by Formulae (1-d) and (1-g) areexemplified as a particularly preferable structure.

<Method of Preparing Oxazine Compound>

The oxazine compound of the present invention can be obtained byallowing a phenol compound in which a reactive functional group isintroduced to a molecular skeleton, and an aromatic amino compound inwhich a reactive functional group is introduced to the molecularskeleton to react with formaldehyde. Examples of the reactive functionalgroup include an ethynyl group and a propargyloxy group. Examples of thephenol compound in which a reactive functional group is introduced tothe molecular skeleton is introduced include 2-propargyloxyphenol,3-propargyloxyphenol, 4-propargyloxyphenol, 4′-propargyloxy-4-biphenol,4′-propargyloxy-3-biphenol, 4′-propargyloxy-2-biphenol,2-propargyloxy-1-naphthol, 3-propargyloxy-1-naphthol,4-propargyloxy-1-naphthol, 5-propargyloxy-1-naphthol,6-propargyloxy-1-naphthol, 7-propargyloxy-1-naphthol,8-propargyloxy-1-naphthol, 1-propargyloxy-2-naphthol,3-propargyloxy-2-naphthol, 6-propargyloxy-2-naphthol, and7-propargyloxy-2-naphthol. Examples of the aromatic amino compound inwhich the reactive functional group is introduced to the molecularskeleton include 2-propargyloxyaniline, 3-propargyloxyaniline,4-propargyloxyaniline, 4′-propargyloxybiphenyl-4-amine,4′-propargyloxybiphenyl-3-amine, 4′-propargyloxybiphenyl-2-amine,2-propargyloxy-1-aminonaphthalene, 3-propargyloxy-1-aminonaphthalene,4-propargyloxy-1-aminonaphthalene, 5-propargyloxy-1-aminonaphthalene,6-propargyloxy-1-aminonaphthalene, 7-propargyloxy-1-aminonaphthalene,8-propargyloxy-1-aminonaphthalene, 1-propargyloxy-2-aminonaphthalene,3-propargyloxy-2-aminonaphthalene, 6-propargyloxy-2-aminonaphthalene,and 7-propargyloxy-2-aminonaphthalene. As to the reaction, for example,the phenol compound in which the reactive functional group is introducedto the molecular skeleton, and the aromatic amino compound in which thereactive functional group is introduced to the molecular skeleton reactwith formaldehyde under the temperature condition of 50° C. to 100° C.,the aqueous layer and the organic layer are separated after completionof the reaction, and then an organic solvent is dried under reducedpressure from an organic layer, thereby obtaining an oxazine compound.

In addition, formaldehyde may be used in the form of either formalinwhich is in a solution state or paraformaldehyde which is in a solidstate.

<Resin Composition>

The resin composition of the present invention contains the oxazinecompound of the present invention.

The cured product obtained by curing the resin composition of thepresent invention is excellent in the thermal decomposition resistance,and excellent in the dielectric properties and the low hygroscopicity,and thus can be preferably used for a heat-resistant member and anelectronic member.

<Reactive Compound>

The resin composition of the present invention may contain a compound tobe blended therein besides the oxazine compound of the presentinvention.

For example, the resin composition may have a reactive compound otherthan the oxazine compound of the present invention. The reactivecompound referred to here is a compound having a reactive group, whichmay be a monomer, an oligomer, or a polymer.

The reactive group may be a functional group which does not react withthe oxazine compound of the present invention or a functional groupwhich reacts with the oxazine compound, but in order to further improvethe heat resistance, the functional group which reacts with the oxazinecompound of the present invention is preferable.

Examples of the functional group which reacts with the oxazine compoundof the present invention include an epoxy group, a cyanato group, amaleimide group, and a phenolic hydroxyl group.

Examples of the compound having an epoxy group include an epoxy resinand a phenoxy resin.

Examples of the compound having a cyanato group include a cyanate esterresin.

Examples of the compound having a maleimide group include a maleimideresin and a bismaleimide compound. Examples of the compound having aphenolic hydroxyl group include a phenol resin and a phenol compound.

The above-described reactive compound may have only one kind of reactivegroup, or plural kinds of reactive groups. Also, the number of thefunctional groups may be one or plural.

Preferable examples of the reactive compound include an epoxy resin, aphenoxy resin, a cyanate ester resin, a maleimide compound, a phenolcompound, and an oxazine compound other than the oxazine compoundobtained by the present invention.

The epoxy resin is not particularly limited as long as it has an epoxygroup, and examples thereof include a bisphenol A type epoxy resin, abisphenol F type epoxy resin, a bisphenol E type epoxy resin, abisphenol S type epoxy resin, a bisphenol sulfide type epoxy resin, aphenylene ether type epoxy resin, a naphthylene ether type epoxy resin,a biphenyl type epoxy resin, a tetramethylbiphenyl type epoxy resin, aterphenyl type epoxy resin, a polyhydroxy naphthalene type epoxy resin,a phenol novolac type epoxy resin, a cresol novolac type epoxy resin, atriphenylol methane type epoxy resin, a tetraphenylolmethane type epoxyresin, a tetraphenylolethane type epoxy resin, adicyclopentadiene-phenol addition reaction type epoxy resin, a phenolaralkyl type epoxy resin, a naphthol novolac type epoxy resin, anaphthol aralkyl type epoxy resin, a biphenyl aralkyl type epoxy resin,a naphthol-phenol co-condensed novolac type epoxy resin, anaphthol-cresol co-condensed novolac type epoxy resin, a naphthyleneether type epoxy resin, an aromatic hydrocarbon formaldehyde resinmodified phenolic resin type epoxy resin, a biphenyl modified novolactype epoxy resin, and an anthracene type epoxy resin. Each of these maybe used alone, or two or more kinds thereof may be used in combination.

The phenoxy resin is a high molecular weight thermoplastic polyetherresin based on diphenol and epihalohydrin such as epichlorohydrin, andthe weight average molecular weight is preferably 20,000 to 100,000.Examples of the structure of the phenoxy resin include structures havingone or more kinds selected from a bisphenol A skeleton, a bisphenol Fskeleton, a bisphenol S skeleton, a bisphenol acetophenone skeleton, anovolac skeleton, a biphenyl skeleton, a fluorene skeleton, adicyclopentadiene skeleton, a norbornene skeleton, a naphthaleneskeleton, an anthracene skeleton, an adamantane skeleton, a terpeneskeleton, and a trimethyl cyclohexane skeleton.

Examples of the cyanate ester resin include a bisphenol A type cyanateester resin, a bisphenol F type cyanate ester resin, a bisphenol E typecyanate ester resin, a bisphenol S type cyanate ester resin, a bisphenolsulfide type cyanate ester resin, a phenylene ether type cyanate esterresin, a naphthylene ether type cyanate ester resin, a biphenyl typecyanate ester resin, a tetramethylbiphenyl type cyanate ester resin, apolyhydroxy naphthalene type cyanate ester resin, a phenol novolac typecyanate ester resin, a cresol novolac type cyanate ester resin, atriphenylmethane type cyanate ester resin, a tetraphenylethane typecyanate ester resin, a dicyclopentadiene-phenol addition reaction typecyanate ester resin, a phenol aralkyl type cyanate ester resin, anaphthol novolac type cyanate ester resin, a naphthol aralkyl typecyanate ester resin, a naphthol-phenol co-condensed novolac type cyanateester resin, a naphthol-cresol co-condensed novolac type cyanate esterresin, an aromatic hydrocarbon formaldehyde resin-modified phenol resintype cyanate ester resin, a biphenyl modified novolac type cyanate esterresin, and an anthracene type cyanate ester resin. Each of these may beused alone, or two or more kinds thereof may be used in combination.

Among these cyanate ester resins, in particular, from the viewpoint ofobtaining a cured product excellent in the heat resistance, a bisphenolA type cyanate ester resin, a bisphenol F type cyanate ester resin, abisphenol E type cyanate ester resin, a polyhydroxy naphthalene typecyanate ester resin, a naphthylene ether type cyanate ester resin, and anovolac type cyanate ester resin are preferable, and from the viewpointof obtaining a cured product excellent in dielectric properties, adicyclopentadiene-phenol addition reaction type cyanate ester resin ispreferable.

As the maleimide compound, for example, various compounds represented byany one of Structural Formulae (i) to (iii) can be exemplified.

(In the formula, R is an m-valent organic group, α and β are each ahydrogen atom, a halogen atom, an alkyl group, or an aryl group, and sis an integer of 1 or more.)

(In the formula, R is any one of a hydrogen atom, an alkyl group, anaryl group, an aralkyl group, a halogen atom, a hydroxyl group, and analkoxy group, s is an integer of 1 to 3, and t is an average of 0 to 10on a repeating unit.)

(In the formula, R is any one of a hydrogen atom, an alkyl group, anaryl group, an aralkyl group, a halogen atom, a hydroxyl group, and analkoxy group, s is an integer of 1 to 3, and t is an average of 0 to 10on a repeating unit.)

Each of these compounds may be used alone, or two or more kinds thereofmay be used in combination.

The phenolic hydroxyl group-containing compound is not particularlylimited as long as it has a phenolic hydroxyl group, and examplesthereof include bisphenol A, bisphenol F, bisphenol E, bisphenol S,bisphenol sulfide, dihydroxydiphenyl ether, a hydroxypolyphenylene ethercompound, a hydroxynaphthylene ether compound, biphenol,tetramethylbiphenol, terphenyl diol, polyhydroxy naphthalene, a phenolnovolac resin, a cresol novolac resin, triphenylol methane,tetraphenylolmethane, tetraphenylolethane, a dicyclopentadiene-phenoladdition reaction product, a phenol aralkyl compound, a hydroxybiphenylaralkyl compound, a naphthol novolac compound, a naphthol aralkylcompound, a naphthol-phenol co-condensed novolac resin, anaphthol-cresol co-condensed novolac resin, an aromatic hydrocarbonformaldehyde resin-modified phenol compound, a biphenyl modifiedphenolic resin (a polyhydric phenol compound in which a phenol nucleusis linked with a bismethylene group), a biphenyl modified naphthol resin(a polyhydric naphthol compound in which a phenol nucleus is linked witha bismethylene group), an aminotriazine-modified phenolic resin (apolyhydric phenol compound in which a phenol nucleus is linked withmelamine, benzoguanamine, and the like), and a polyhydric phenolcompound such as an alkoxy group-containing aromatic ring-modifiednovolac resin (a polyhydric phenol compound in which a phenol nucleusand an alkoxy group-containing aromatic ring are linked withformaldehyde), and hydroxyanthracene. Each of these may be used alone,or two or more kinds thereof may be used in combination.

The oxazine compound other than the oxazine compound obtained by thepresent invention is not particularly limited, and examples thereofinclude a reaction product of bisphenol F, formalin, and aniline (a F-atype benzoxazine resin), a reaction product of4,4′-diaminodiphenylmethane, formalin, and phenol (a P-d typebenzoxazine resin), a reaction product of bisphenol A, formalin, andaniline, a reaction product of dihydroxydiphenyl ether, formalin, andaniline, a reaction product of diaminodiphenyl ether, formalin, andphenol, a reaction product of dicyclopentadiene-phenol addition typeresin and formalin, and aniline, a reaction product of phenolphthalein,formalin, and aniline, and a reaction product of dihydroxydiphenylsulfide, formalin, and aniline. Each of these may be used alone, or twoor more kinds thereof may be used in combination.

<Filler>

The composition of the present invention may further contain a filler inaddition to the oxazine compound. Examples of the filler include aninorganic filler and an organic filler. Examples of the inorganic fillerinclude an inorganic fine particle.

Examples of the inorganic fine particle include alumina, magnesia,titania, zirconia, silica (quartz, fumed silica, precipitated silica,silicic anhydride, fused silica, crystalline silica, ultrafine amorphoussilica, and the like), and the like as a material having excellent heatresistance; boron nitride, aluminum nitride, alumina oxide, titaniumoxide, magnesium oxide, zinc oxide, silicon oxide, and the like as amaterial having excellent thermal conductivity; a metal filler and/or ametal-coated filler using a metal simple substance or an alloy (forexample, iron, copper, magnesium, aluminum, gold, silver, platinum,zinc, manganese, and stainless steel) as a material having excellentconductivity; minerals such as mica, clay, kaolin, talc, zeolite,wollastonite, and smectite, and potassium titanate, magnesium sulfate,sepiolite, zonolite, aluminum borate, calcium carbonate, titanium oxide,barium sulfate, zinc oxide, and magnesium hydroxide as a material havingexcellent barrier properties; barium titanate, zirconia oxide, titaniumoxide, and the like as a material having a high refractive index;photocatalytic metals such as titanium, cerium, zinc, copper, aluminum,tin, indium, phosphorus, carbon, sulfur, terium, nickel, iron, cobalt,silver, molybdenum, strontium, chromium, barium, and lead, a compositeof the metal, oxides thereof, and the like as a material exhibitingphotocatalytic properties; metals such as silica, alumina, zirconia, andmagnesium oxide, complexes and oxides thereof, and the like as amaterial having excellent abrasion resistance; metals such as silver andcopper, tin oxide, indium oxide, and the like as a material havingexcellent conductivity; and silica and the like as a material havingexcellent insulating properties; and titanium oxide, zinc oxide, and thelike as a material having excellent ultraviolet shielding.

These inorganic fine particles may be appropriately selected dependingon the application, and may be used alone or plural kinds thereof may beused in combination. In addition, the inorganic fine particles havevarious features besides the features exemplified in the examples, andthus may be selected according to the application as required.

For example, in the case where silica is used as an inorganic fineparticle, there is no particular limitation, and known silica fineparticles such as powdered silica and colloidal silica can be used.Examples of commercially available powdered silica fine particlesinclude Aerosil 50,200 manufactured by Nippon Aerosil Co., Ltd., SILDEXH31, H32, H51, H52, H121, and H122 manufactured by Asahi Glass Co.,Ltd., E220A and E220 manufactured by Nippon Silica Industry Co., SYLYSIA470 Fuji Silysia chemical Co., Ltd., and SG Flake manufactured by NipponSheet Glass Co., Ltd.

Examples of commercially available colloidal silica include methanolsilica sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP,ST-20, ST-40, ST-C, ST-N, ST-O, ST-50, and ST-OL manufactured by NissanChemical Industries, Ltd.

Surface-modified silica fine particles may be used, and examples thereofinclude those obtained by surface-treating the silica fine particleswith a reactive silane coupling agent having a hydrophobic group orthose modified with a compound having a (meth)acryloyl group. Examplesof the commercially available powdered silica modified with a compoundhaving a (meth)acryloyl group include Aerosil RM50 and R711 manufacturedby Nippon Aerosil Co., Ltd., and examples of the commercially availablecolloidal silica modified with a compound having a (meth)acryloyl groupinclude MIBK-SD manufactured by Nissan Chemical Industries, Ltd.

The shape of the silica fine particle is not particularly limited, andspherical, hollow, porous, rod, plate, fiber, or irregular shapes can beused. The primary particle size is preferably in the range of 5 to 200nm. If it is smaller than 5 nm, the inorganic fine particle in thedispersion is not sufficiently dispersed, and if it is larger than 200nm, sufficient strength of the cured product may not be maintained.

As the titanium oxide fine particle, not only an extender pigment butalso an ultraviolet photoresponsive photocatalyst can be used. Forexample, anatase type titanium oxide, rutile type titanium oxide, andbrookite type titanium oxide can be used. It is also possible to useparticles designed to cause the crystal structure of titanium oxide tobe doped with different elements so as to respond to visible light. Ananion element such as nitrogen, sulfur, carbon, fluorine, andphosphorus, or a cationic element such as chromium, iron, cobalt, andmanganese is suitably used as an element to be doped in titanium oxide.In addition, as a form, a sol or slurry dispersed in powder, organicsolvent, or water can be used. Examples of commercially availablepowdered titanium oxide fine particles include Aerosil P-25 manufacturedby Nippon Aerosil Co., Ltd., and ATM-100 manufactured by TaycaCorporation. Examples of commercially available slurry-like finetitanium oxide particles include TKD-701 manufactured by TaycaCorporation.

<Fibrous Substrate>

The composition of the present invention may further contain a fibroussubstrate in addition to the oxazine compound. The fibrous substrate ofthe present invention is not particularly limited, and is preferablythose used for a fiber-reinforced resin, and examples thereof includeinorganic fiber or organic fiber.

As the inorganic fiber, in addition to inorganic fibers such as carbonfiber, glass fiber, boron fiber, alumina fiber, and silicon carbidefiber, mineral fibers such as carbon fiber, activated carbon fiber,graphite fiber, glass fiber, tungsten carbide fiber, silicon carbidefiber (silicon carbide fiber), ceramic fiber, alumina fiber, naturalfiber, and basalt, and boron fiber, boron nitride fiber, boron carbidefiber, metal fiber, and the like can be exemplified. Examples of themetal fibers include aluminum fiber, copper fiber, brass fiber,stainless steel fiber, and steel fiber.

As the organic fiber, synthetic fibers made of a resin material such aspolybenzazole, aramid, PBO (polyparaphenylene benzoxazole),polyphenylene sulfide, polyester, acrylic, polyamide, polyolefin,polyvinyl alcohol, and polyarylate; natural fibers such as cellulose,pulp, cotton, wool, and silk, and regenerated fibers such as proteins,polypeptides, and alginic acid can be exemplified.

Among them, carbon fiber and glass fiber have wide industrialapplicability, and thus preferably used. Among them, only one kind maybe used, or plural kinds may be used at the same time.

The fibrous substrate of the present invention may be an aggregate offibers, and the fibers may be continuous or discontinuous, and may bewoven cloth or nonwoven cloth. In addition, fiber bundles in whichfibers are aligned in one direction may be used, or a sheet form inwhich fiber bundles are arranged may be used. Further, athree-dimensional form of aggregate of fibers having a thickness may beused.

<Dispersion Medium>

In the composition of the present invention, a dispersion medium may beused for the purpose of adjusting the solid content and viscosity of thecomposition. As the dispersion medium, any liquid medium may be used aslong as the effect of the present invention is not impaired, and variousorganic solvents, liquid organic polymers, and the like can beexemplified.

Examples of the organic solvent include ketones such as acetone, methylethyl ketone (MEK), and methyl isobutyl ketone (MIBK), cyclic etherssuch as tetrahydrofuran (THF) and dioxolane, esters such as methylacetate, ethyl acetate, and butyl acetate, aromatic compounds such astoluene and xylene, and alcohols such as carbitol, cellosolve, methanol,isopropanol, butanol, and propylene glycol monomethyl ether. These canbe used alone or in combination, and among them, methyl ethyl ketone ispreferable from the viewpoint of volatility at the time of coating andsolvent recovery.

The liquid organic polymer is a liquid organic polymer that does notdirectly contribute to the curing reaction, and examples thereof includea carboxyl group-containing polymer modified product (Floren G-900,NC-500: Kyoeisha Co., LTD.), acrylic polymers (Floren WK-20: KyoeishaCo., LTD.), an amine salt of a special modified phosphate ester (HIPLAADED-251: Kusumoto Chemicals, Ltd.), and a modified acrylic blockcopolymer (DISPERBYK 2000; BYK Additives & Instruments).

<Resin>

In addition, the composition of the present invention may have a resinother than the oxazine compound. As the resin, a known and commonly usedresin may be blended as long as the effect of the present invention isnot impaired, and examples thereof include a thermosetting resin or athermoplastic resin.

The thermosetting resin is a resin having the property of changing to besubstantially insoluble and infusible when being cured by heating or bymeans such as radiation or catalyst. Specific examples thereof include aphenol resin, a urea resin, a melamine resin, a benzoguanamine resin, analkyd resin, an unsaturated polyester resin, a vinyl ester resin, adiallyl terephthalate resin, an epoxy resin, a silicone resin, aurethane resin, a furan resin, a ketone resin, a xylene resin, athermosetting polyimide resin, and a benzoxazine resin other than theoxazine compound obtained by the present invention. These thermosettingresins can be used alone or two or more kinds thereof may be used incombination.

The thermoplastic resin is a resin which can be melt-molded throughheating. Specific examples thereof include a polyethylene resin, apolypropylene resin, a polystyrene resin, a rubber modified polystyreneresin, an acrylonitrile-butadiene-styrene (ABS) resin, anacrylonitrile-styrene (AS) resin, a polymethyl methacrylate resin, anacrylic resin, a polyvinyl chloride resin, a polyvinylidene chlorideresin, a polyethylene terephthalate resin, an ethylene vinyl alcoholresin, a cellulose acetate resin, a ionomer resin, a polyacrylonitrileresin, a polyamide resin, a polyacetal resin, a polybutyleneterephthalate resin, a polylactic acid resin, a polyphenylene etherresin, a modified polyphenylene ether resin, a polycarbonate resin, apolysulfone resin, a polyphenylene sulfide resin, a polyetherimideresin, a polyethersulfone resin, a polyarylate resin, a thermoplasticpolyimide resin, a polyamide imide resin, a polyetheretherketone resin,a polyketone resin, a liquid crystal polyester resin, a fluorine resin,a syndiotactic polystyrene resin, and a cyclic polyolefin resin. Thesethermoplastic resins can be used alone or two or more kinds thereof maybe used in combination.

<Curing Agent>

In the composition of the present invention, a curing agent may be useddepending on the compound blended therein, for example, in the casewhere a compound having an epoxy group is blended, various kinds ofcuring agents such as an amine-based curing agent, an amide-based curingagent, an acid anhydride-based curing agent, a phenol-based curingagent, an aminotriazine novolac resin, an active ester resin, and aresin having a functional group capable of reacting with an epoxy group,such as carboxyl group or thiol, may be used in combination.

Examples of the amine-based curing agent include diaminodiphenylmethane, diaminodiphenyl ether, diaminodiphenyl ether, diaminodiphenylsulfone, orthophenylene diamine, meta-phenylene diamine, paraphenylenediamine, metaxylene diamine, paraxylene diamine, diethyl toluenediamine, diethylene triamine, triethylene tetramine, isophorone diamine,imidazole, a BF3-amine complex, a guanidine derivative, and a guanaminederivative.

Examples of the amide-based curing agent include dicyandiamide, apolyamide resin synthesized from a dimer of linolenic acid andethylenediamine.

Examples of the acid anhydride-based curing agent include phthalicanhydride, trimellitic anhydride, pyromellitic anhydride, maleicanhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalicanhydride, methylnadic anhydride, hexahydrophthalic anhydride, andmethyl hexahydrophthalic anhydride.

Examples of the phenolic curing agent include bisphenol A, bisphenol F,bisphenol S, resorcin, catechol, hydroquinone, fluorene bisphenol,4,4′-biphenol, 4,4′,4″-trihydroxytriphenylmethane, naphthalene diol,1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, calixarene, a phenol novolacresin, a cresol novolac resin, an aromatic hydrocarbon formaldehyderesin-modified phenolic resin, a dicyclopentadiene phenol addition typeresin, a phenol aralkyl resin (a xyloc resin), a polyhydric phenolnovolac resin synthesized from a polyhydric hydroxy compound typified bya resorcin novolac resin and formaldehyde, a naphthol aralkyl resin, atrimethylolmethane resin, a tetraphenylolethane resin, a naphtholnovolac resin, a naphthol-phenol co-condensed novolac resin, anaphthol-cresol co-condensed novolac resin, and polyhydric phenolcompounds such as a biphenyl modified phenolic resin (a polyhydricphenol compound in which a phenol nucleus is linked with a bismethylenegroup), a biphenyl modified naphthol resin (a polyhydric phenol compoundin which a phenol nucleus is linked with a bismethylene group), anaminotriazine-modified phenol resin (a polyhydric phenol compound inwhich a phenol nucleus is linked with melamine, benzoguanamine, or thelike), and an alkoxy group-containing aromatic ring-modified novolacresin (a polyhydric phenol compound in which a phenol nucleus and analkoxy group-containing aromatic ring are linked with formaldehyde).

These curing agents may be used alone or two or more kinds thereof maybe used in combination.

In addition, in the case where the composition of the present inventioncontains the compound having an epoxy group, a cure accelerator may beused alone or may be used in combination with the curing agent. Variouscompounds which accelerate the curing reaction of the epoxy resin may beused as the cure accelerator, and examples thereof include a phosphoruscompound, a tertiary amine compound, an imidazole compound, an organicacid metal salt, a Lewis acid, and an amine complex salt. Among them, animidazole compound, a phosphorus compound, or a tertiary amine compoundis preferably used, and particularly in the case being used for asemiconductor sealing material application, triphenylphosphine for thephosphorus compound and 1,8-diazabicyclo-[5.4.0]-undecene (DBU) for thetertiary amine are preferably used from the viewpoint of excellentcurability, heat resistance, electrical characteristics, moistureresistance reliability, and the like.

<Other Compounds>

The composition of the present invention may contain other compounds tobe blended. Examples of the other compounds include a catalyst, apolymerization initiator, an inorganic pigment, an organic pigment, anextender pigment, clay mineral, wax, a surfactant, a stabilizer, a flowregulator, a coupling agent, dye, a leveling agent, a rheology controlagent, a UV absorber, an antioxidant, a flame retardant, and aplasticizer.

<Cured Product>

The cured product obtained by curing the composition of the presentinvention is excellent in the thermal decomposition resistance, and thedielectric properties, and the low hygroscopicity, and thus can bepreferably used for a heat-resistant member and an electronic member. Amethod of molding a cured product is not particularly limited, and thecomposition may be molded alone, or may be molded as a laminate bylaminating with a base material.

As the base material of the laminate, an inorganic material such asmetal or glass, an organic material such as plastic or wood, and thelike may be suitably used depending on the application, and the shape ofthe laminate may be a flat plate, or a sheet shape, or the laminate mayhave a three-dimensional structure or may have a three-dimensionalshape. The laminate may have any shape according to the purpose, such asone having curvature on the whole surface or a part thereof. Also, thehardness, thickness, and the like of the base material are not limited.In addition, the cured product of the present invention may be set as abase material, and the cured product of the present invention may befurther laminated.

In applications for a circuit board and a semiconductor packagesubstrate, it is preferable to laminate a metal foil, and examples ofthe metal foil include a copper foil, an aluminum foil, a gold foil, anda silver foil, and from the viewpoint of good workability, a copper foilis preferably used.

In the laminate of the present invention, a layer of the cured productmay be formed directly on the base material by coating or molding, andthose already molded may be laminated. In the case of direct coating,the coating method is not particularly limited, and examples thereofinclude a spray method, a spin coating method, a dipping method, a rollcoating method, a blade coating method, a doctor roll method, a doctorblade method, a curtain coating method, a slit coating method, a screenprinting method, and an ink jet method. In the case of direct molding,in-mold molding, insert molding, vacuum molding, extrusion laminationmolding, press molding and the like can be exemplified.

In the case of laminating the composition subjected to molding, theuncured or semi-cured composition layer may be laminated and then cured,or the layer of the cured product in which the composition is completelycured may be laminated on the base material.

In addition, the cured product of the present invention may be laminatedby applying and curing a precursor which can serve as a base material,and the precursor which can serve as a base material or the compositionof the present invention being bonded in an uncured or semi-cured statemay be bonded and then cured. The precursor which can serve as a basematerial is not particularly limited, and various kinds of curable resincompositions can be exemplified.

<Fiber-Reinforced Resin>

In the case where the composition of the present invention contains afibrous substrate which is a reinforced fiber, the compositioncontaining the fibrous substrate can be used as a fiber-reinforcedresin.

The method of incorporating the fibrous substrate in the composition isnot particularly limited as long as it does not impair the effect of thepresent invention and the fibrous substrate and the composition may becomposited by methods such as kneading, applying, impregnating,injecting, and pressing. The method can be suitably selected accordingto the form of the fiber and the use of the fiber-reinforced resin.

The method of molding the fiber-reinforced resin of the presentinvention is not particularly limited. If a plate-shaped product is tobe produced, an extrusion molding method is generally used, but it isalso possible with a flat press. In addition, an extrusion moldingmethod, a blow molding method, a compression molding method, a vacuummolding method, an injection molding method, and the like can be used.When a film-shaped product is to be produced, a solution casting methodcan be used in addition to a melt extrusion method, and when a meltmolding method is used, it is possible to use inflation film molding,cast molding, extrusion lamination molding, calendar molding, sheetmolding, fiber molding, blow molding, injection molding, rotationalmolding, and coating molding. In the case of a resin that is cured byactive energy rays, a cured product can be produced using various curingmethods using active energy rays. In particular, in the case where athermosetting resin is used as a main component for a matrix resin, amolding method in which the molding material is made into a prepreg andthen pressurized and heated by a press or an autoclave, can beexemplified, and additionally, resin transfer molding (RTM), vaccumassist resin transfer molding (VaRTM), laminate molding, hand lay-upmolding, and the like can be exemplified.

<Prepreg>

The fiber-reinforced resin of the present invention can form a statecalled uncured or semi-cured prepreg. After the product is circulated inthe state of the prepreg, the cured product may be formed by finalcuring. In the case of forming a laminate, the prepreg is formed, theother layers are then laminated thereon, and curing is performedfinally, thereby advantageously providing a laminate where each layer isin intimate contact with each other.

Although the mass ratio of the composition and the fibrous substrateused at this time is not particularly limited, it is generallypreferable to prepare such that the resin content in the prepreg is 20%to 60% by mass.

<Heat-Resistant Material and Electronic Material>

The cured product utilizing the oxazine compound of the presentinvention is excellent in the thermal decomposition resistance, thedielectric properties, and the low hygroscopicity, and thus it can besuitably used for a heat-resistant member and an electronic member. Inparticular, it can be suitably used for a semiconductor sealingmaterial, a circuit board, a build-up film, a build-up substrate, andthe like. It can also be suitably used for a matrix resin of afiber-reinforced resin, and is particularly suitable as a prepreg withhigh heat resistance. The heat-resistant member and the electronicmember thus obtained can be suitably used for various applications, andexamples of the various applications include industrial machine parts,general mechanical parts, parts such as automobiles, railway, orvehicles, parts related to space and aviation, electronic and electricparts, building materials, containers and packaging members, dailynecessities, sports and leisure goods, and cabin member for wind powergeneration, but it is not limited to these applications.

Representative products will be described below with examples.

1. Semiconductor Sealing Material

As a method of obtaining a semiconductor sealing material from thecomposition of the present invention, a method of sufficiently meltingand mixing the above composition, a cure accelerator, and a compoundingagent such as an inorganic filler using an extruder, a kneader, a rollor the like if necessary, can be exemplified. At this time, fused silicais generally used as the inorganic filler, but when it is used as a highthermal conductive semiconductor sealing material for a power transistorand a power IC, it is preferable to use a high packing density ofcrystalline silica, alumina, and silicon nitride each having higherthermal conductivity than fused silica, or use fused silica, crystallinesilica, alumina, silicon nitride or the like. The filling rate ispreferably 30% to 95% by mass of the inorganic filler per 100 parts bymass of the curable resin composition, among them, in order to achieveimprovement of flame retardancy, moisture resistance, and solder crackresistance, and decrease in a linear expansion coefficient, it is morepreferably equal to or more than 70 parts by mass, and is still morepreferably equal to or more than 80 parts by mass.

2. Semiconductor Device

Examples of a semiconductor package molding for obtaining asemiconductor device from the curable resin composition of the presentinvention include a method in which the semiconductor sealing materialis molded using a casting machine, a transfer molding machine, aninjection molding machine or the like, and further heated at 50° C. to250° C. for 2 to 10 hours.

3. Printed Circuit Board

Examples of a method of obtaining a printed circuit board from thecomposition of the present invention include a method of laminating theabove prepregs in a conventional manner, and appropriately laminating acopper foil, and heating and crimping the laminate at 170° C. to 300° C.under pressure of 1 to 10 MPa for 10 minutes to 3 hours.

4. Build-Up Substrate

As a method of obtaining a build-up substrate from the composition ofthe present invention, for example, the following steps can beexemplified. First, a step in which a circuit substrate on which acircuit is formed is coated with the composition appropriatelycontaining a rubber, a filler, and the like blended therein by using aspray coating method, a curtain coating method, or the like, and thenthe coated circuit board is cured (step 1). Thereafter, a step in whicha hole such as a predetermined through hole portion is drilled, ifnecessary, then a surface is treated with a roughening agent, thesurface is subjected to hot water washing so as to form irregularities,and a plating treatment with metal such as copper is performed (step 2).A step in which such operations are sequentially repeated as desired,and the resin insulating layer and the conductor layers of thepredetermined circuit pattern are alternately built up (step 3). Notethat, the drilling of the through hole portion is performed afterforming the outermost resin insulating layer. Further, in the build-upsubstrate of the present invention, a resin-coated copper foil obtainedby semi-curing the resin composition on a copper foil is heated andpressed onto a circuit board on which a circuit is formed at 170° C. to300° C., thereby enabling the formation of a build-up substrate whileomitting a step of forming a roughened surface and a plating treatment.

5. Build-Up Film

As a method of obtaining a build-up film from the composition of thepresent invention, a method of producing a layer (X) of the compositionformed by coating the surface of a support film (Y) as a base materialwith the composition and further drying the organic solvent by heating,hot air blowing or the like can be exemplified.

Examples of the organic solvent used here include ketones such asacetone, methyl ethyl ketone, and cyclohexanone, acetate esters such asethyl acetate, butyl acetate, cellosolve acetate, propylene glycolmonomethyl ether acetate, and carbitol acetate, carbitols such ascellosolve and butyl carbitol, aromatic hydrocarbons such as toluene andxylene, dimethyl formamide, dimethyl acetamide, and N-methyl pyrrolidoneare preferably used, and, it is preferable to use it in a proportionthat the nonvolatile content is 30% to 60% by mass.

The thickness of the layer (X) to be formed is generally equal to orlarger than the thickness of the conductor layer. The thickness of theconductor layer of the circuit board is generally 5 to 70 μm, and thusthe thickness of the resin composition layer is preferably 10 to 100 μm.The layer (X) of the composition in the present invention may beprotected with a protective film described later. Protection with aprotective film makes it possible to prevent adhesion of dust orscratches and the like to the surface of the resin composition layer.

Examples of the support film and the protective film include polyolefinssuch as polyethylene, polypropylene, and polyvinyl chloride,polyethylene terephthalate (hereinafter, abbreviated as “PET” in somecases), polyester such as polyethylene naphthalate, polycarbonate, andpolyimide, release paper, and metal foil such as copper foil andaluminum foil. In addition to the mud treatment and the coronatreatment, the support film and the protective film may be subjected toa release treatment. The thickness of the support film is notparticularly limited, and is generally 10 to 150 μm, and is preferably25 to 50 μm. The thickness of the protective film is preferably 1 to 40μm.

The support film (Y) is peeled off after being laminated on a circuitboard or after forming an insulating layer by heat curing. Since thesupport film (Y) is peeled off after the curable resin composition layerconstituting the build-up film is cured by heating, adhesion of dust andthe like in the curing step can be prevented. In the case of peelingafter curing, the support film is generally subjected to the releasingtreatment in advance.

A multilayer printed circuit board can be produced using the build-upfilm obtained as described above. For example, in the case where thelayer (X) is protected with a protective film, after separating ittherefrom, the layer (X) is laminated on one side or both sides of thecircuit board, for example, by a vacuum lamination method, such that thelayer (X) is in direct contact with the circuit board. The method oflamination may be batch type or continuous type with roll. If necessary,the build-up film and the circuit board may be heated (pre-heated)before laminating. As to the conditions of the lamination, a crimpingtemperature (lamination temperature) is preferably 70° C. to 140° C., acrimping pressure is preferably 1 to 11 kgf/cm2 (9.8×104 to 107.9×104N/m²), and the lamination is preferably performed under reduced pressuresuch as air pressure of 20 mmHg (26.7 hPa) or less.

6. Conductive Paste

As a method of obtaining a conductive paste from the composition of thepresent invention, for example, a method of dispersing conductiveparticles in the composition can be exemplified. Depending on the kindsof conductive particles used, the conductive paste can be a circuitconnection paste resin composition or an anisotropic conductiveadhesive.

EXAMPLES

Next, the present invention will be specifically described withreference to examples and comparative examples. In the followingdescription, “part” and “%” are based on mass unless otherwisespecified.

Note that, ¹H and ¹³C-NMR, MS spectrum and IR were measured under thefollowing conditions.

¹H-NMR: measurement was performed using “JNM-ECA600” manufactured byJEOL RESONANCE.

Magnetic Field Strength: 600 MHz

Number of integrations: 16 times

Solvent: DMSO-d6

Sample concentration: 30% by mass

¹³C-NMR: measurement was performed using “JNM-ECA600” manufactured byJEOL RESONANCE.

Magnetic Field Strength: 150 MHz

Number of integrations: 4,000 times

Solvent: DMSO-d6

Sample concentration: 30% by mass

FD-MS: measurement was performed using “JMS-T100GC AccuTOF” manufacturedby JEOL Ltd.

Measurement range: m/z=50.00 to 2000.00

Change rate: 25.6 mA/min

Final current value: 40 mA

Cathode voltage: −10 kV

Example 1

Synthesis of Oxazine Compound (A-1)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 147.2 g (1.0 mol) of 4-propargyloxyaniline, and 148.2 g(1.0 mol) of 4-propargyloxyphenol with nitrogen gas flowing, the mixturewas dissolved in 750 g of toluene, then 63.9 g (2.0 mol) of 94%paraformaldehyde was added thereto, the temperature was raised to 80° C.while stirring, and a reaction was performed at 80° C. for 7 hours.After the reaction, the resultant was transferred to a separatingfunnel, and an aqueous layer was removed. Thereafter, the solvent wasremoved from the organic layer by heating under reduced pressure so asto obtain 239 g of oxazine compound (A-1).

From the aspect that ¹H-NMR indicated peaks at 7.04 ppm (2H), 6.87 ppm(2H), 6.75 ppm (2H), 6.62 ppm (1H), 5.22 ppm (2H), 4.59 ppm (4H), 4.51ppm (2H), and 2.49 ppm (2H), ¹³C-NMR indicated peaks at 152.8 ppm, 151.5ppm, 149.0 ppm, 143.1 ppm, 121.3 ppm, 120.5 ppm, 117.5 ppm, 115.7 ppm,115.0 ppm, 112.9 ppm, 80.4 ppm, 78.8 ppm, 78.8 ppm, 75.4 ppm, 75.4 ppm,56.5 ppm, 56.2 ppm, and 51.1 ppm, and a matrix spectrum indicated a peakat M⁺=319, it was confirmed that an oxazine compound (A-1) representedby the following formula was obtained.

Synthesis Example 1

Synthesis of Monopropargyl Ether-Containing Mixture (C-1)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 400.0 g (2.1 mol) of 4,4′-biphenol and 5,000 mL ofdehydrated THF with nitrogen gas flowing, and the mixture was stirredand dissolved. While maintaining the reaction solution at 10° C. orless, 85.9 g (2.1 mol) of sodium hydride (60%, dispersed in liquidparaffin) was added in portions over one hour. After returning to roomtemperature over one hour, the temperature was raised to set a refluxstate. Under reflux, 319.4 g (2.1 mol) of propargyl bromide (80% toluenesolution) was added dropwise over one hour. After completion of thedropwise addition, the reaction was performed under reflux for 24 hours.

After cooling to room temperature, sodium bromide was removed byfiltration, and THF and toluene were removed under reduced pressure.3,600 g of ethyl acetate was added to a residue to dissolve, and thenwas washed with alkali three times using 1,200 g of 10% aqueous sodiumhydroxide solution. Subsequently, washing was performed twice with 1,800g of ion-exchanged water. Sodium sulfate was added for drying, and thenethyl acetate was removed by filtration under reduced pressure. Vacuumdrying was performed at 60° C. for 12 hours so as to obtain 76.0 g of amilky white solid (C-1). ¹H-NMR indicated peaks at 9.44 ppm (1H), 7.51ppm to 7.40 ppm (4H), 7.01 ppm (2H), 6.81 ppm (2H), 4.80 ppm (2H), and3.55 ppm (1H), and ¹³C-NMR indicated peaks at 156.6 ppm, 156.0 ppm,133.5 ppm, 130.6 ppm, 127.3 ppm, 126.9 ppm, 115.6 ppm, 115.5 ppm, 115.2ppm, 79.3 ppm, 78.1 ppm, and 55.4 ppm, which was confirmed to be amixture (C-1) containing monopropargyl ether as an objective substance.

<Composition of Mixture (C-1)>

Monopropargyl ether 52.1%

Dipropargyl ether 44.9%

HPLC area % Detection wavelength of 254 nm

Synthesis Example 2

Synthesis of Monopropargyl Ether-Containing Mixture (C-2)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 400.0 g (2.1 mol) of 4,4′-biphenol and 3,000 mL ofdehydrated THF with nitrogen gas flowing, and the mixture was stirredand dissolved. While maintaining the reaction solution at 10° C. orless, 43.0 g (1.1 mol) of sodium hydride (60%, dispersed in liquidparaffin) was added in portions over one hour. After returning to roomtemperature over one hour, the temperature was raised to set a refluxstate. Under reflux, 159.7 g (1.1 mol) of propargyl bromide (80% toluenesolution) was added dropwise over one hour. After completion of thedropwise addition, the reaction was performed under reflux for 24 hours.

After cooling to room temperature, sodium bromide was removed byfiltration, and THF and toluene were removed under reduced pressure.2,000 g of ethyl acetate was added to a residue to dissolve, and thenwas washed with alkali three times using 1,200 g of 10% aqueous sodiumhydroxide solution. Subsequently, washing was performed twice with 1,800g of ion-exchanged water. Sodium sulfate was added for drying, and thenethyl acetate was removed by filtration under reduced pressure. Vacuumdrying was performed at 60° C. for 12 hours so as to obtain 98.7 g of amilky white solid (C-2). ¹H-NMR indicated peaks at 9.44 ppm (1H), 7.51ppm to 7.40 ppm (4H), 7.01 ppm (2H), 6.81 ppm (2H), 4.80 ppm (2H), and3.55 ppm (1H), and ¹³C-NMR indicated peaks at 156.6 ppm, 156.0 ppm,133.5 ppm, 130.6 ppm, 127.3 ppm, 126.9 ppm, 115.6 ppm, 115.5 ppm, 115.2ppm, 79.3 ppm, 78.1 ppm, and 55.4 ppm, which was confirmed to be amixture (C-2) containing monopropargyl ether as an objective substance.

<Composition of Mixture (C-2)>

Monopropargyl ether 81.7%

Dipropargyl ether 18.3%

HPLC area % Detection wavelength of 254 nm

Example 2

Synthesis of Oxazine Compound (A-2) (Reaction Product A-2-1)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 29.4 g (0.2 mol) of 4-propargyloxyaniline, and 76.0 gof monopropargyl ether-containing mixture (C-1) with nitrogen gasflowing, the mixture was dissolved in 150 g of toluene, then 12.8 g (0.4mol) of 94% paraformaldehyde was added thereto, the temperature wasraised to 80° C. while stirring, and a reaction was performed at 80° C.for 7 hours. After the reaction, the resultant was transferred to aseparating funnel, and an aqueous layer was removed. Thereafter, thesolvent was removed from the organic layer by heating under reducedpressure so as to obtain 84.9 g of reaction product containing oxazinecompound (A-2).

From the aspect that ¹H-NMR indicated peaks at 7.35 ppm to 7.30 ppm(3H), 7.09 ppm to 7.01 ppm (3H), 6.88 ppm to 6.75 ppm (5H), 5.38 ppm(2H), 4.67 ppm to 4.62 ppm (6H), and 2.49 ppm (2H), ¹³C-NMR indicatedpeaks at 171.2 ppm, 156.3 ppm, 153.2 ppm, 151.8 ppm, 142.3 ppm, 133.1ppm, 132.1 ppm, 127.2 ppm, 125.6 ppm, 125.0 ppm, 121.6 ppm, 119.4 ppm,116.6 ppm, 115.6 ppm, 115.3 ppm, 80.3 ppm, 79.9 ppm, 79.6 ppm, 78.2 ppm,78.0 ppm, 55.7 ppm, and 49.7 ppm, and a matrix spectrum indicated a peakat M⁺=395, it was confirmed that a reaction product (A-2-1) having apurity of 54% of the oxazine compound A-2 was obtained.

Example 3

Synthesis of Oxazine Compound (A-2) (Reaction Product A-2-2)

108.3 g of reaction product (A-2-2) having a purity of 91% of theoxazine compound A-2 was obtained by performing the same operation as inExample 2 except that the mixture (C-1) was changed to a mixture (C-2).

Comparative Synthesis Example 1

Synthesis of Oxazine Compound (B-1)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 93.1 g (1.0 mol) of aniline and 94.1 g (1.0 mol) ofphenol with nitrogen gas flowing, the mixture was dissolved in 750 g oftoluene, then 63.9 g (2.0 mol) of 94% paraformaldehyde was addedthereto, the temperature was raised to 80° C. while stirring, and areaction was performed at 80° C. for 7 hours. After the reaction, theresultant was transferred to a separating funnel, and an aqueous layerwas removed. Thereafter, the solvent was removed from the organic layerby heating under reduced pressure so as to obtain 189 g of oxazinecompound (B-1).

From the aspect that ¹H-NMR indicated peaks at 7.24 ppm to 7.05 ppm(7H), 6.87 ppm to 6.70 ppm (2H), 5.43 ppm (2H), and 4.64 ppm (2H),¹³C-NMR indicated peaks at 154.0 ppm, 147.8 ppm, 129.1 ppm, 127.7 ppm,127.2 ppm, 121.3 ppm, 120.5 ppm, 120.5 ppm, 117.4 ppm, 116.2 ppm, 78.4ppm, and 48.9 ppm, and a matrix spectrum indicated a peak at M⁺=211, itwas confirmed that an oxazine compound (B-1) represented by thefollowing formula was obtained.

Comparative Synthesis Example 2

Synthesis of 1,4-Hydroquinone Dipropargyl Ether (B-2)

A four-neck flask equipped with a dropping funnel, a thermometer, astirring device, a heating device, and a reflux condensor with coolingwas charged with 40.0 g (0.4 mol) of 1,4-hydroquinone and 1 L of acetonewith nitrogen gas flowing, and the mixture was stirred and dissolved.After adding 110.5 g (0.8 mol) of potassium carbonate, the temperaturewas raised to set a reflux state. After 30 minutes under reflux, 118.8 g(0.8 mol) of propargyl bromide (80% toluene solution) was added dropwiseover one hour. After completion of the dropwise addition, the reactionwas performed under reflux for 24 hours.

After cooling to room temperature, potassium carbonate was removed byfiltration, and acetone was removed under reduced pressure. 200 mL ofchloroform was added to and dissolved in the residue, and then washedwith 200 mL of ion-exchanged water twice. Magnesium sulfate was addedfor drying, and then chloroform was removed by filtration under reducedpressure. Further, vacuum drying was performed at 80° C. for 12 hours soas to obtain 64 g of light brown crystal. ¹H-NMR indicated peaks at 6.93ppm to 6.86 ppm (4H), 4.70 ppm (4H), and 3.51 ppm (2H), and ¹³C-NMRindicated peaks at 151.7 ppm, 115.8 ppm, 79.4 ppm, 78.0 ppm, and 55.8ppm, which was confirmed to be 1,4-hydroquinone dipropargyl ether as anobjective substance represented by the following formula.

Examples 4 to 6 and Comparative Examples 1 to 3

Preparation of Composition and Molded Product

Any one of the oxazine compounds (A-1, A-2-1, A-2-2, and B-1) obtainedin Examples 1 to 3 and Comparative Synthesis Example 1, 1,4-hydroquinonedipropargyl ether (B-2) obtained in Comparative Synthesis Example 2, anda comparative dihydrooxazine compound (“P-d type benzoxazine” (reactionproduct of 4,4′-diaminodiphenylmethane, formalin, and phenol),manufactured by SHIKOKU CHEMICALS CORPORATION.), and a phenol resin(“TD-2131”, phenol novolac resin manufactured by DIC Corporation) weremixed at a ratio indicated in Table 1 so as to prepare respectivecompositions.

Each composition was subjected to the following conditions to prepare acured product.

<Cured Product>

Curing conditions: After two hours at 170° C., two hours at 200° C.,further heat cured at 250° C. for 2 hours

Thickness after molding: 2.4 mm

With respect to the cured products, various physical properties wereevaluated by the following method. The results are shown in Table 1.

<Glass Transition Temperature>

A cured product having a thickness of 2.4 mm was cut into a size of 5 mmin width and 54 mm in length, and this was used as a test piece 1. Thetemperature at which the elastic modulus change of the test piece 1reached a maximum (tan 5 change rate was the largest) was evaluated asthe glass transition temperature by using a viscoelasticity measuringdevice (DMA: solid viscoelasticity measuring device “DMS 7100”manufactured by Hitachi High-Tech Science Co., Ltd., deformation mode:bifurcated bending, measurement mode: sinusoidal vibration, frequency of1 Hz, and heating rate of 3° C./min).

<Thermal Decomposition Resistance>

A cured product having a thickness of 2.4 mm was finely cut and ameasurement was performed in a nitrogen atmosphere at a heating rate of5° C./min using a thermogravimetric analyzer (“TG/DTA 6200” manufacturedby SII NanoTechnology Inc.), and the temperature (Td5) at which the 5%by weight decrease was exhibited was determined.

TABLE 1 Example Example Example Comparative Comparative Comparative 4 56 Example 1 Example 2 Example 3 A-1 g 20 A-2-1 g 20 A-2-2 g 20 B-1 g 20B-2 g 20 P-d type g 20 benzoxazine TD-2131 g  0.2  0.2  0.2 0.2 0.2 0.2Evaluation of physical properties Glass ° C. 360< 360< 360< 140 — 226transition temperature Tg (DMA) Thermal ° C. 364   389   399   310 — 369decomposition resistance (Td5)

The composition in Comparative Example 2 was not cured under the curingconditions, and it was impossible to obtain a test piece capable ofevaluating the physical properties.

INDUSTRIAL APPLICABILITY

The cured product utilizing the oxazine compound of the presentinvention is excellent in the thermal decomposition resistance, thedielectric properties, and the low hygroscopicity, and thus it can besuitably used for a heat-resistant member and an electronic member. Inparticular, it can be suitably used for a semiconductor sealingmaterial, a circuit board, a build-up film, a build-up substrate, andthe like. It can also be suitably used for a matrix resin of afiber-reinforced resin, and is particularly suitable as a prepreg withhigh heat resistance.

1. An oxazine compound comprising: a structure of General Formula (1);and at least two or more functional groups R¹ each independentlyrepresented by General Formula (2):

(in Formula (1), Ar¹ represents a substituted or unsubstituted aromaticgroup, a ring A represents a substituted or unsubstituted aromatic ring,and a compound of Formula (1) may have an alkyl group having 1 to 3carbon atoms or a substituted or unsubstituted aromatic group):[Chem. 2]a ¹-X¹—Y¹—X²—≡—R²  (2) (in Formula (2), X¹, X², and Y¹ eachindependently represent a single bond or a divalent linking group, R²represents a hydrogen atom, a hydrocarbon group, or a hydrocarbon groupin which one or more hydrogen atoms contained in the hydrocarbon groupare substituted with any one of a hydroxyl group, an alkoxy group, and ahalogen atom, and a¹ represents a bonding point to the oxazine compound(1)).
 2. The oxazine compound according to claim 1, which is representedby General Formula (1-1):

(in Formula (1-1), R¹'s are each independently a functional grouprepresented by General Formula (2), and R³ and R⁴ each independentlyrepresent a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, ora substituted or unsubstituted aromatic group).
 3. The oxazine compoundaccording to claim 1, wherein the ring A is a substituted orunsubstituted benzene ring or a substituted or unsubstituted naphthalenering.
 4. A composition comprising the oxazine compound according toclaim
 1. 5. The composition according to claim 4, further comprising areactive compound.
 6. The composition according to claim 4, furthercomprising a filler.
 7. The composition according to claim 4, furthercomprising a fibrous substrate.
 8. A cured product, which is obtained bycuring the composition according to claim
 4. 9. A laminate comprising: abase material; and a layer of the cured product according to claim 8.10. A composition for a heat-resistant material, comprising thecomposition according to claim
 4. 11. A heat-resistant member comprisingthe cured product according to claim
 8. 12. A composition for anelectronic material, comprising the composition according to claim 4.13. An electronic member comprising the cured product according to claim8.
 14. A semiconductor sealing material comprising the compositionaccording to claim
 4. 15. A prepreg comprising the compositioncontaining a fibrous substrate according to claim
 7. 16. A circuit boardfurther comprising the prepreg according to claim 15 and a copper foillayer.
 17. The laminate according to claim 9, which is a build-up film.18. A build-up substrate comprising the build-up film according to claim17.